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CD is an essential metrology technique that leverages geometric RCWA simulations to map process parameters for micro- and nano-structured elements. This project provides an excellent opportunity to contribute to a high-impact program while gaining hands-on experience with advanced optical metrology and simulations.
Description
Minimum Qualifications
Strong academic background in optical physics, optical engineering, or a related field.
Experience with OCD metrology, RCWA simulations, or similar optical modeling techniques.
Analytical mindset with a focus on accuracy and detail in synthesizing simulated and experimental data
Ability to work independently on complex, research-driven tasks while effectively communicating findings to the team.
Must hold relevant work permit in Japan for the duration of the internship.
Currently enrolled in a PhD Program
Preferred Qualifications